PULSED LASER/ELECTRON DEPOSITION SYSTEM
PULSED LASER/ELECTRON DEPOSITION SYSTEM |
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Neocera’s systems are built for materials R&D and offer maximum flexibility. The advantages of Neocera’s systems will be realized when the user is working with a variety of materials under a variety of processing conditions. The large “bandwidth” in both system design (flexibility) and film processing conditions is unique to Neocera. The systems incorporate the following critical components which are required by scientists -beginning a PLD lab for the first time as well as those who want to experiment with advanced PLD technology. |
Pulsed Electron Deposition is a process in which a pulsed
(100ns) high power electron beam (approximately 1000A,
15keV) penetrates approximately 1 μm into the target
resulting in a rapid evaporation of target material. The nonequilibrium
heating of the target facilitates stochiometric
ablation of the target material. Under optimum conditions,
the target stoichiometry is thus preserved in the deposited
films. All solid state materials-metals, semiconductors and
insulators, can be deposited as thin films with PED. |
Neocera, a market leader in Pulsed Laser Deposition and Pulsed Electron
Deposition, introduces Neocera EX-125 Excimer laser for PLD applications. Maximum pulse energy : 125 mJ @248 nm Maximum repetition rate : 60Hz Maximum average power : 6W Beam divergence : 0.8 x 1.6 mRad Pulse width : 16-22 ns Static gas life time : 60-90 days (to 50% energy) |
| PULSED LASER DEPOSITION SYSTEM | PULSED ELECTRON DEPOSITION SYSTEM | EX-125 EXCIMER LASER |
